Jun 30, 2021
Garage Semiconductor Fab Gets Reactive-Ion Etching Upgrade
Posted by Genevieve Klien in categories: chemistry, computing
It’s a problem that few of us will likely ever face: once you’ve built your first homemade integrated circuit, what do you do next? If you’re [Sam Zeloof], the answer is clear: build better integrated circuits.
At least that’s [Sam]’s plan, which his new reactive-ion etching setup aims to make possible. While his Z1 dual differential amplifier chip was a huge success, the photolithography process he used to create the chip had its limitations. The chemical etching process he used is a bit fussy, and prone to undercutting of the mask if the etchant seeps underneath it. As its name implies, RIE uses a plasma of highly reactive ions to do the etching instead, resulting in finer details and opening the door to using more advanced materials.
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