Lifeboat Foundation

Helium ion beam (HIB) technology plays an important role in the extreme fields of nanofabrication. Due to high resolution and sensitivity, HIB nanofabrication technology is widely used to pattern nanostructures into components, devices, or systems in integrated circuits, materials sciences, nano-optics, and bio-sciences applications. HIB-based nanofabrication includes direct-write milling, ion beam-induced deposition, and direct-write lithography without the need to resist assistance. Their nanoscale applications have also been evaluated in the areas of integrated circuits, materials sciences, nano-optics, and biological sciences.

In a new paper published in the International Journal of Extreme Manufacturing, a team of researchers, led by Dr. Deqiang Wang from Chongqing Key Laboratory of Multi-scale Manufacturing Technology, Chongqing Institute of Green and Intelligent Technology, Chinese Academy of Sciences, PR China, have summarized comprehensively the extreme processes and applications of HIB nanofabrication.

The main aim of this review is to address the latest developments in HIB technology with their extreme processing capabilities and widespread applications in nanofabrication. Based on the introduction of the HIM system with GFIS, the performance characteristics and advantages of HIB technology have been discussed first. Thereafter, certain questions about the extreme processes and applications of HIB nanofabrication have been addressed: How many extreme processes and applications of HIB technology have been developed in nanofabrication for integrated circuits, materials sciences, nano-optics, and bio-sciences applications? What are the main challenges in the extreme nanofabrication with HIB technology for high resolution and sensitivity applications?

3D micro-/nanofabrication holds the key to building a large variety of micro-/nanoscale materials, structures, devices, and systems with unique properties that do not manifest in their 2-D planar counterparts. Recently, scientists have explored some very different 3D fabrication strategies such as kirigami and origami that make use of the science of cutting and folding 2-D materials/structures to create versatile 3D shapes. Such new methodologies enable continuous and direct 2-D-to-3D transformations through folding, bending and twisting, with which the occupied space can vary “nonlinearly” by several orders of magnitude compared to the conventional 3D fabrications. More importantly, these new-concept kirigami/origami techniques provide an extra degree of freedom in creating unprecedented 3D micro-/nanogeometries beyond the imaginable designs of conventional subtractive and additive fabrication.

In a new paper published in Light: Science & Applications, Chinese scientists from Beijing Institute of Technology and South China University of Technology made a comprehensive review on some of the latest progress in kirigami/origami in micro-/nanoscale. Aiming to unfold this new regime of advanced 3D micro-/nanofabrication, they introduced and discussed various stimuli of kirigami/origami, including capillary force, residual stress, mechanical stress, responsive force and focused-ion-beam irradiation induced stress, and their working principles in the micro-/nanoscale region. The focused-ion-beam based nano-kirigami, as a prominent example coined in 2018 by the team, was highlighted particularly as an instant and direct 2-D-to-3D transformation technique. In this method, the focused ion beam was employed to cut the 2-D nanopatterns like “knives/scissors” and gradually “pull” the nanopatterns into complex 3D shapes like “hands”.

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