The Okinawa Institute of Science and Technology (OIST) has designed a new type of extreme ultraviolet (EUV) lithography equipment that could significantly reduce the cost to produce 7nm and smaller semiconductors, and thus revolutionize the chip manufacturing supply chain.
According to reports, the EUV equipment’s optical system is greatly simplified while power consumption is reduced by a factor of ten, raising the prospect of much cheaper advanced chip-making machines.
If so, it could mark the end of ASML’s monopoly on EUV lithography, which would have serious implications for semiconductor manufacturers, investors and governments.
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