{"id":134424,"date":"2022-01-20T19:24:34","date_gmt":"2022-01-21T03:24:34","guid":{"rendered":"https:\/\/lifeboat.com\/blog\/2022\/01\/intel-has-placed-an-order-for-the-next-gen-high-na-euv-tools-to-fabricate-1-8nm-chips"},"modified":"2022-01-20T19:24:34","modified_gmt":"2022-01-21T03:24:34","slug":"intel-has-placed-an-order-for-the-next-gen-high-na-euv-tools-to-fabricate-1-8nm-chips","status":"publish","type":"post","link":"https:\/\/lifeboat.com\/blog\/2022\/01\/intel-has-placed-an-order-for-the-next-gen-high-na-euv-tools-to-fabricate-1-8nm-chips","title":{"rendered":"Intel has placed an order for the next-gen High-NA EUV tools to fabricate 1.8nm chips"},"content":{"rendered":"<p><a class=\"aligncenter blog-photo\" href=\"https:\/\/lifeboat.com\/blog.images\/intel-has-placed-an-order-for-the-next-gen-high-na-euv-tools-to-fabricate-1-8nm-chips2.jpg\"><\/a><\/p>\n<p><a href=\"https:\/\/www.neowin.net\/news\/tags\/asml\/\">ASML<\/a> President and CTO Martin van den Brink said:<\/p>\n<blockquote><p>\u201cIntel\u2019s vision and early commitment to ASML\u2019s High-NA EUV technology is proof of its relentless pursuit of Moore\u2019s Law. Compared to the current EUV systems, our innovative extended EUV roadmap delivers continued lithographic improvements at reduced complexity, cost, cycle time and energy that the chip industry needs to drive affordable scaling well into the next decade.\u201d<\/p><\/blockquote>\n<p>Intel plans to start high-volume manufacturing (HVM) in 2025, which is also when the company will be using its 18A (1.8nm) <a href=\"https:\/\/www.neowin.net\/news\/tags\/fabrication\/\">fabrication<\/a> technology. To do so, Intel has been experimenting for quite a while when it first obtained ASML\u2019s Twinscan EXE:5000, which was the industry\u2019s first EUV scanner with a 0.55 numerical aperture. Today, the company ordered ASML\u2019s next-generation High-NA tool, the Twinscan EXE:5200.<\/p>\n","protected":false},"excerpt":{"rendered":"<p>ASML President and CTO Martin van den Brink said: \u201cIntel\u2019s vision and early commitment to ASML\u2019s High-NA EUV technology is proof of its relentless pursuit of Moore\u2019s Law. Compared to the current EUV systems, our innovative extended EUV roadmap delivers continued lithographic improvements at reduced complexity, cost, cycle time and energy that the chip industry [\u2026]<\/p>\n","protected":false},"author":662,"featured_media":0,"comment_status":"open","ping_status":"closed","sticky":false,"template":"","format":"standard","meta":{"footnotes":""},"categories":[1523,1522],"tags":[],"class_list":["post-134424","post","type-post","status-publish","format-standard","hentry","category-computing","category-innovation"],"_links":{"self":[{"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/posts\/134424","targetHints":{"allow":["GET"]}}],"collection":[{"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/posts"}],"about":[{"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/types\/post"}],"author":[{"embeddable":true,"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/users\/662"}],"replies":[{"embeddable":true,"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/comments?post=134424"}],"version-history":[{"count":0,"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/posts\/134424\/revisions"}],"wp:attachment":[{"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/media?parent=134424"}],"wp:term":[{"taxonomy":"category","embeddable":true,"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/categories?post=134424"},{"taxonomy":"post_tag","embeddable":true,"href":"https:\/\/lifeboat.com\/blog\/wp-json\/wp\/v2\/tags?post=134424"}],"curies":[{"name":"wp","href":"https:\/\/api.w.org\/{rel}","templated":true}]}}